The ever-changing skin care segment is the cosmetics industry’s largest, and with break-neck growth in emerging markets, alongside continuing demand for natural and anti-aging products in developed markets, there are big rewards for those who can capture the imagination of these consumers.
Although continuous innovation is key to staying on top, this is increasingly challenging in a category that prides itself on being the most technologically advanced and fastest moving in the beauty industry.
With research so vast and in-depth, tackling the challenges of sustainability, regulatory compliance, and formulation in finished products are all vital for future success.
In this, the fourth successive Cosmetics Design online event, we bring you the latest consumer and market insights, scientific developments and technical innovations in the Skin Care Ingredients space.
Who should attend?
SkinCareIngredients2014 targets skin care and cosmetics R&D professionals, scientists, marketers, brand owners and formulators with an active involvement in the creation of skin care products.
Alexander Kielbassa : Business Development Manager – Global Marketing Cosmetics at Merck KGaA,
April Guo : Head of Cosmetics Regulatory Affairs at CIRS China,
Arnoldo Fonseca : Market Manager, Americas Region, Personal Care at Air Products and Chemicals Inc.
Dr. Dagmar Kleefeld : Marketing Cosmetics at Merck KGaA,
Dr. Daniel Schmid : Head of Research at Mibelle Biochemistry,
Dr. Fred Zülli : Managing Director at Mibelle Biochemistry,
Dr. Rodger D. Curren : President of IIVS ( Institute of In-vitro sciences),
Joaquin Perez Sanchez : Market Manager, EMEA Region Personal Care at Air Products and Chemicals Inc.
Karen Doskow : Consumer Products Director at Kline & Company,
Laurent Blasco : Global Skincare Technical / Application Manager at Lubrizol Advanced Materials Europe BVBA,
Lee Roberts : Marketing Communications Manager, Personal and Home Care at Lubrizol Advanced Materials Inc.,
Maren Sowa-Gueuble : European Sales Manager Cosmetics at SCHOTT France,